Direct Patterning of Metal Chalcogenide Semiconductor Materials

Nano-/Microporous Materials: Crystalline Metal-Chalcogenide Superlattices

This article describes the recent research progress in the field of crystalline metal-chalcogenide superlatticescontaining tetrahedron-shaped nanoclusters as building units. With the development of new synthetic strategies and structuralconcepts, new clusters that are members of three series of tetrahedral clusters (i.e., supertetrahedral clusters, pentasupertetrahedralclusters, and...

Metal hierarchical patterning by direct nanoimprint lithography

Three-dimensional hierarchical patterning of metals is of paramount importance in diverse fields involving photonics, controlling surface wettability and wearable electronics. Conventionally, this type of structuring is tedious and usually involves layer-by-layer lithographic patterning. Here, we describe a simple process of direct nanoimprint lithography using palladium benzylthiolate, a versa...

Direct Patterning of Functional Materials via Atmospheric-Pressure Ion Deposition

Interest in thin films of functional materials has increased enormously in recent years because of the wide range of possible applications. Here we report an experimental setup we have termed Atmospheric-Pressure Ion Deposition (APID) as a novel technique that allows highly controllable and soft processing of various materials (e.g. polymers, bio molecules and inorganic materials) into thin and...

Materials for Direct Metal Laser-sintering

Superatoms and Metal-semiconductor Motifs for Cluster Materials